News Story
Adomaitis, Rubloff, Kidder own U.S. Patent 6,821,910
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This is a multizone, segmented showerhead for use in chemical vapor deposition, in plasma deposition and etching and other processes. It provides a gas impingement flux distribution controllable in two lateral dimensions to achieve programmable uniformity in recirculation (pumping) of exhaust gases back through the showerhead. It reduces intersegment mixing to achieve a high degree of spatial control of the process. The showerhead is useful for process tuning and optimization in manufacturing or for rapid materials and process discovery and optimization in research and development. | ISR patents page |
—December 2004
Published December 7, 2004