NSF GOALI: Physically Based Models of Atomic Layer Deposition for High-Throughput Reactor Design
NSF GOALI: Physically Based Models of Atomic Layer Deposition for High-Throughput Reactor Design
Descriptions
With new energy, electronics, and consumer product applications, and the emergence of highthroughput reactor designs, Atomic Layer Deposition (ALD) is set to become a major thin-film manufacturing tool.